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Turnkey GC Solutions

Brochure

SEMICONDUCTOR, LCD AND LED ANALYTICAL SOLUTIONS

When it comes to the semiconductor, LCD and LED industry, the pace at which it advances has been quite a driver for us. To remain at the forefront, we’ve had to develop innovative solutions rapidly, constantly evolving to meet more and more stringent requirements. As a result, we’re proud to say that we offer the most advanced, innovative range of semiconductor, LCD and LED solutions in our field – and our portfolio is proof of our commitment to you.

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Application Note

AN-16 Fast crude argon analysis with the mini gcsense platform technical report

This report presents the results acquired for crude argon analysis (trace nitrogen in oxygen) using the ASDevices’ Mini GCSense platform. Parameters were optimized for a measurement range of 0-1000ppm, but over-range N2 concentrations can also be measured. Learn about the configuration of the Mini GCSense platform for crude argon analysis.

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Application Note

AN-15 Trace Sulfur in Fuel-Grade H2 without SCD, FPD and Thermal Desorber.

Find out about the test report for our trace sulfur in hydrogen analysis solution. Our devices are without SCD or FPD detector and do not need a thermal desorber to concentrate the sulfur impurities contained in the sample to achieve the current target standard of 4 ppb LOD (Limit Of Detection). Our solution is made with high-quality components and our simple to use SePdd sensor, only involves inert carrier gas usage and is solid state.

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Application Note

AN-10 – Purged lip sealing valve for sulfur analysis

Ultra-trace sulfur analysis is known to be a difficult measurement. Special consideration need to be taken in regards to the inertness of all inert parts. For that reason, special coating technologies were developed to resolve poor performance with chromatographic valve inert coating. This document explains the benefits of the PLSV valve technology.

Application Note

AN-09 – Measurement of sulfur-based compounds in hydrogen with enhanced plasma discharge (Epd) technology

A sample containing sulfur-based compounds in hydrogen was analyzed using gas chromatography with the enhanced plasma discharge (Epd) technology. Results show detection of all sulfur-based compounds with a LOD down to 1ppb. The method’s sensitivity was further increased with sample pre-concentration using ASDevices’ PLSV valve and its unique peak remodeling algorithm (patent pending). Epd technology is a revolutionary alternative to sulfur chemiluminescence detectors (SCD) and flame photometric detectors (FPD) for the measurement of sulfur-based impurities in fuel-grade hydrogen.

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Application Note

AN-04 – Improving argon recovery

Improving argon recovery in air separation plants

To not only reach but maintain optimum argon extraction efficiency, the argon draw-off mixture must be properly controlled. Plants usually maintain a low level of nitrogen in the crude argon to avoid a halt in production, but this results in poor argon recovery. Our GC Sense Series resolves all this by better controlling air separation’s existing low pressure column. And that means you’ll benefit from higher argon production – and lower overall operating costs.

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Data Sheet

Greenhouse gases

Our ecofriendly innovative solution for greenhouse gases analysis uses nitrogen carrier gas unlike FID solutions for CH4 and N 2O measurement that are requiring H2 as a combustible. Our simple chromatographic solution has been designed with robustness, performance and cost of ownership in mind, using our solid-state Enhanced plasma discharge technology for measurements.

Data Sheet

O2 purity

Our hydrocarbons analytical solution has been built keeping in mind that robustness, performance and affordability are important in the field of Air Separation. Get peace of mind and achieve unsurpassed performance with ASDevices high quality components: a highly sensitive eFID detector, a low maintenance leak proof GC valve and a reliable industrial GC platform offering advanced features such as IIot capability.

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Data Sheet

Lab bottling center

Customers are requiring more stringent control of gas quality with impurity levels in gases expected to be well below 50 ppb. Thanks to our patented enhanced plasma discharge technology, our gas quality certification solution offers the lowest limit of detection on the market, ranging from 5 to 15 ppb. Get unsurpassed analytical performance and advanced signal processing with our high-quality components like our ultra-sensitive scalable enhanced plasma discharge detector (SePdd).

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Data Sheet

Crude Argon

Crude argon is a very common application for air separation plant optimization. Get the simplest and fasted crude argon analyzer in the world, thanks to ASDevices exclusive enhanced plasma discharge (Epd) detectortechnology and proprietary spectral compensation algorithm technology. Achieve a 30 second analysis cycle with our very simple chromatographic method that uses only one valve, one column and no O2 trap. With our parallel chromatographic channel, the cycle time can be as short as 15 seconds.

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Data Sheet

Helium purity

Our helium quality analysis solution is the most compact on the market. ASDevices solution features high quality components and delivers unsurpassed performance with all the features required for industrial gas manufacturers or any other application needing helium quality analysis. Improve robustness and reduce overall operational costs thanks to our proprietary enhanced plasma discharge (Epd) sensing technology, that can be used with helium carrier gas, and our simple chromatographic process.

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Data Sheet

Argon purity

Our argon quality analysis solution is the most compact on the market. Thanks to ASDevices high quality components, it delivers unsurpassed performance and all the features required for industrial gas manufacturers or any other application that needs argon quality analysis. Our proprietary enhanced plasma discharge (Epd) sensing technology, that can be used with argon carrier gas, combined with our simple chromatographic process, improves robustness and reduce overall operational cost.

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GC Valves

Application Note

AN-10 PLSV – Improved valve technology for ultra-trace sulfur analysis

Ultra-trace sulfur analysis is known to be a difficult measurement. Special consideration need to be taken in regards to the inertness of all inert parts. For that reason, special coating technologies were developed to resolve poor performance with chromatographic valve inert coating. This document explains the benefits of the PLSV valve technology.

Brochure

PLSV Sample Stream Selection brochure

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Brochure

PLSV Injector Valve brochure

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Brochure

PPDV brochure

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Application Note

AN-17 PLSV valve purge technology explained with the leak management principle

We have tested pretty much all existing GC valves (Valco, Siemens, Yokogawa, ABB, AFP) and spent decades reviewing existing valve designs to improve them. The output is over 30 patents to improve lifetime, reduce leaks and dead volume, etc. We were able to improve valve leak integrity for traditional conical rotary and diaphragm valve technologies. All valves leak or will leak at some point but what matters is leak level and rate. The ultimate challenge was to design a valve with longer lifetime, less wearing and that can manage inevitable leaks without impacting the chromatographic performance. This is the purpose of our PLSV technology.

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Application Note

AN-16 Fast crude argon analysis with the mini gcsense platform technical report

This report presents the results acquired for crude argon analysis (trace nitrogen in oxygen) using the ASDevices’ Mini GCSense platform. Parameters were optimized for a measurement range of 0-1000ppm, but over-range N2 concentrations can also be measured. Learn about the configuration of the Mini GCSense platform for crude argon analysis.

下载PDF文件
Application Note

AN-15 Trace Sulfur in Fuel-Grade H2 without SCD, FPD and Thermal Desorber.

Find out about the test report for our trace sulfur in hydrogen analysis solution. Our devices are without SCD or FPD detector and do not need a thermal desorber to concentrate the sulfur impurities contained in the sample to achieve the current target standard of 4 ppb LOD (Limit Of Detection). Our solution is made with high-quality components and our simple to use SePdd sensor, only involves inert carrier gas usage and is solid state.

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Application Note

AN-14 Working with challenging samples

Guide for ASDevices customers for sampling systems and GC configuration for reactive and/or toxic sample matrices. Also applies to reactive or toxic impurities in a stable or inert sample background. The goals are to create a safe working environment and avoid equipment damages caused by a reactive sample leaking into the equipment. This application note should be used by trained and competent personnel in conjunction with specific hardware manufacturer’s instruction.

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Application Note

AN-13 – Pressure Drop and Dead Volume: PLSV against diaphragm valve

The PLSV valve technology is compared against an AFP ELDV-2 Diaphragm valve for the measurement of VOCs using a gas chromatograph/Mass-Spectrometer instrument. The third-party test demonstrates the benefits of the purge lip sealing valve (PLSV) technology against the diaphragm valve for pressure drop and dead volume performance.

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Application Note

AN-10 – Purged lip sealing valve for sulfur analysis

Ultra-trace sulfur analysis is known to be a difficult measurement. Special consideration need to be taken in regards to the inertness of all inert parts. For that reason, special coating technologies were developed to resolve poor performance with chromatographic valve inert coating. This document explains the benefits of the PLSV valve technology.

Application Note

AN-08 – A quantum leap for chromatographic valve

This application note demonstrates the unique characteristics of the Purge Lip Sealing Valve (PLSV) technology for gas chromatography and sample stream selection. The performance is demonstrated from results obtained on a chromatograph designed to measure trace N2 with a range of 1000 ppb and a limit of detection of 1 ppb.

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Application Note

AN-05 – Purged Lip Sealing Valve

The Purged Lip Sealing Valve (PLSV) technological innovation is the result of many years of experience and customer feedback in a quest to improve the diaphragm and conical rotary valve concept. The outcome is our PLSV valve which has shown, following intensive testing, a superior performance compared to any other valve on the market. Find out about our patented valve technology that combines the best of conical rotary and diaphragm valves.

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Supporting accessories

Brochure

Gas calibration system (GCS) brochure

Learn more about our Gas calibration/dilution system to accurately prepare reference gas standard

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Brochure

Intelligent gas calibration system (iGCS) brochure

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Application Note

AN-11 – New method using argon as an alternative to helium for sub-ppb level measurement

Simplify your chromatography and improve limit of detection (below 1 ppb) for permanent gases in various matrix with a new measurement method using the ASDevices’ pre-concentration system based on our Trap & Release Purge Lip Sealing Valve. Get improved reliability, faster analysis time and hardware cost savings with our proprietary nanostructured trapping materials and unique valve matrix venting feature allowing most of the matrix to be easily eliminated without using a heartcut or backflush.

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Detectors

Product Guide

Epd User Guide

Introduction to the enhanced plasma discharge detector much more than a detector.

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Application Note

AN-15 Trace Sulfur in Fuel-Grade H2 without SCD, FPD and Thermal Desorber.

Find out about the test report for our trace sulfur in hydrogen analysis solution. Our devices are without SCD or FPD detector and do not need a thermal desorber to concentrate the sulfur impurities contained in the sample to achieve the current target standard of 4 ppb LOD (Limit Of Detection). Our solution is made with high-quality components and our simple to use SePdd sensor, only involves inert carrier gas usage and is solid state.

下载PDF文件
Application Note

AN-11 – New method using argon as an alternative to helium for sub-ppb level measurement

Simplify your chromatography and improve limit of detection (below 1 ppb) for permanent gases in various matrix with a new measurement method using the ASDevices’ pre-concentration system based on our Trap & Release Purge Lip Sealing Valve. Get improved reliability, faster analysis time and hardware cost savings with our proprietary nanostructured trapping materials and unique valve matrix venting feature allowing most of the matrix to be easily eliminated without using a heartcut or backflush.

下载PDF文件
Application Note

AN-04 – Improving argon recovery

Improving argon recovery in air separation plants

To not only reach but maintain optimum argon extraction efficiency, the argon draw-off mixture must be properly controlled. Plants usually maintain a low level of nitrogen in the crude argon to avoid a halt in production, but this results in poor argon recovery. Our GC Sense Series resolves all this by better controlling air separation’s existing low pressure column. And that means you’ll benefit from higher argon production – and lower overall operating costs.

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Tubes and fittings

Brochure

Liplok brochure

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Purifiers

Brochure

iPAPS brochure

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Brochure

ASD Pure brochure

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Turnkey Online Solutions

Brochure

N2 Sense brochure

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GC platforms

Brochure

iMov brochure

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Application Note

AN-16 Fast crude argon analysis with the mini gcsense platform technical report

This report presents the results acquired for crude argon analysis (trace nitrogen in oxygen) using the ASDevices’ Mini GCSense platform. Parameters were optimized for a measurement range of 0-1000ppm, but over-range N2 concentrations can also be measured. Learn about the configuration of the Mini GCSense platform for crude argon analysis.

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