*patent pending

Compact online trace N2 in argon/helium analyser with Enhanced plasma discharge (Epd) technology*

The N2Sense analyser is based on our Enhanced plasma discharge (Epd) technology*. Compared to other commercially available plasma-based analysers, which use a single wavelength measurement, the N2Sense uses a combination of our unique focusing/stabilising and electron injection electrodes with a spectral compensation optical measurement to improve performance and signal stability.

< 1 ppb

Ten times lower limit of detection compared to competitor instruments

Proprietary design leak free flow controller

Interference free

Powerful processing algorithm backed by a digital signal processor, treating multi spectral data

Not affected by moisture or other impurities in the sample background

Advanced embedded interface and software

Industrial grade touch screen display

Multi-touch

Multi language user interface

12 months internal data storage

Interactive help

IIoT ready

Ultra compact

Designed for 19'' rack

(133 x 202 x 330 mm)

(5.25 x 8.0 x 13.0 in)

Ultra stable

Applications

Air separation plants

Chemical plants

Argon purification plants

Helium liquefication plants

Process control

Steel industries

Semiconductor plants

Gas management systems

Speciality gas laboratories

Leak testing

Welding control

Glove box

Cryogenic truck loading stations

Enhanced plasma discharge (Epd) technology

The Enhanced plasma discharge technology brings two dispruptive advancements to the previous and well-known technology (PED).

Advanced embedded software

Unique graphical user interface
IIoT ready
Data trending and alarm history summary
12 months internal data storage

Reach analytical performance with an industrial/instrumentation double ferrule compression fitting
By using LipLOK on your instruments benefit from:

  • Leak detection capability

  • Better leak integrity

  • No dead volume

  • Backward compatible with Swagelok double ferrule standard

First, two stabilising/focusing electrodes* have been introduced in the design to resolve plasma source instability (quenching and filamentary oscillation) and hence signal to noise improvement at low concentration.
 

Second, the electron injection electrodes* improve ionisation efficiency.

Stabilising and focusing electrodes, Enhanced design of Plasma Emission Detector PED, Epd Technology
  • Unique to our Epd technology* and to our proprietary spectral compensation algorithm*.

 

  • Cancel measurement drift from ambient pressure, flow and temperature variations.

  • The result is an unsurpassed measurement precision

Spectral compensation technology*

Ethernet ports IIoT ready

Remote connectivity
Remote data storage
Remote alarm

iOS® and

Android®

compatibility

Proprietary flow controller

Our proprietary leak free flow controller is based on a micro proportional valve and a unique purged enclosure

Purged enclosure

No leak

Improved stability

Reduced noise

Improved reliability

Micro proportional valve

No dead volume

Less drift

Faster response time

Customable optical cartridge

  • Custom ultra stable interference filter

  • Adjustable pre-amp gain

  • Differential measurement, eliminate electrostatic noise coupling

  • Special response bandwidth
    photodiode

Proprietary trap

Our new trap is made of a proprietary material (not molecular sieve). It offers a better absorption to moisture, hydrocarbons and organic compounds. As it has no affinity to N2 but absorb hydrocarbons and organic compounds, it does not delay the response and resolve the problem of the former technology.

Doping

A special doping compounds (H2O + proprietary compounds) is added to the plasma. In combination with the focusing/stabilising and electron injection electrodes, this compound helps to further stabilise the plasma discharge and improve the plasma deexcitation process by which photons are emitted for the optical measurement.

Specifications